Schmidbauer M. X-Ray Diffuse Scattering from Self-Organized Mesoscopic Semiconductor Structures

Springer-Verlag, Berlin, Heidelberg, 2004. – 204 p. – ISBN: 978-3-540-39986-5This monograph represents a critical survey of the outstanding capabilities of X-ray
diffuse scattering for the structural characterization of mesoscopic material systems. The mesoscopic regime comprises length scales ranging from a few up to some hundreds of nanometers. It is of particular relevance at semiconductor layer systems where, for example, interface roughness or low-dimensional objects such as quantum dots and quantum wires have attracted much interest. An extensive overview of the present state-of-the-art theory of X-ray diffuse scattering at mesoscopic structures is given followed by a valuable description of various experimental techniques. Selected up-to-date examples are discussed. The aim of the present book is to combine aspects of self-organized growth of mesoscopic structures with corresponding X-ray diffuse scattering experiments.Basic Principles of X-Ray Diffuse Scattering from Mesoscopic Structures
Experimental Optimization
A Model System: LPE SiGe/Si(001) Islands
Dynamical Scattering Effects at Grazing Incidence Conditions
Characterization of Quantum Dots
Characterization of Interface Roughness
Appendix