Baudrant A, (Ed.) Silicon Technologies: Ion Implantation and Thermal Treatment

ISTE Ltd and John Wiley & Sons, Inc., 2011. — 347 p. — ISBN978-1-84821-231-2.The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.Silicon and Silicon Carbide Oxidation
Ion Implantation
Dopant Diffusion: Modeling and Technological Challenges
Epitaxy of Strained Si/Si1-x Gex Heterostructures